- Electron Beam High Throughput Lithography
- Electronics: EBHT
Универсальный русско-английский словарь. Академик.ру. 2011.
Electron Beam High Throughput Lithography
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Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… … Wikipedia
EBHT — Electron Beam High Throughput Lithography (Academic & Science » Electronics) … Abbreviations dictionary
Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… … Wikipedia
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia
Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Lithographie a faisceau d'electrons — Lithographie à faisceau d électrons L utilisation d un faisceau d électrons pour tracer des motifs sur une surface est connue sous le nom de lithographie par faisceau d électrons. On parle également de lithographie électronique. Par rapport à la… … Wikipédia en Français
Lithographie À Faisceau D'électrons — L utilisation d un faisceau d électrons pour tracer des motifs sur une surface est connue sous le nom de lithographie par faisceau d électrons. On parle également de lithographie électronique. Par rapport à la photolithographie, l avantage de… … Wikipédia en Français
